B3DVM-6000x 3D profiler with 6000x magnification and 100nm measurement resolution
- 3D profiler with Long working distance and very price depth measurement
- Advanced software for roughness, height depth and flatness measurement
- Up to 6000x magnification, 1 to 70mm sample height/thickness measurement, with 100nm / 0.1um measurement resolution
- Incident LED illumination, with brightfield and darkfield imaging
- Excellent extended depth of focus/field
- auto readout of so many measurements such as contour difference
- excellent choice for semi-condocture industry, copper foil, wafer step, arc height, battery, SMT fields
Features
- 3D profiler with extended working distance and exceptional depth measurement capabilities
- Sophisticated software enabling precise measurements of roughness, height depth, and flatness
- Magnification capabilities of up to 6000x, accommodating sample height/thickness measurements ranging from 1mm to 70mm, with a remarkable measurement resolution of 100nm / 0.1μm
- Equipped with incident LED illumination, providing both brightfield and darkfield imaging
- Remarkable extended depth of field, ensuring excellent imaging quality
- Automated readout of numerous measurements, including contour differences
- An outstanding choice for applications in the semiconductor industry, covering areas such as copper foil, wafer steps, arc height, batteries, and SMT fields
B3DVM-6000x 3D profiler with 6000x magnification and 100nm measurement resolution
1. 3D Profiler with ultra-depth precision measuring instrumentThe system allows great measurement of roughness, height, depth and flatness. It has up to 6000x magnification, can do 3D modelling and measure the height at 100nm resolution.
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2. 3D Imaging
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3. Measurement Tools with 3D profilerHigh precision real time measurement Using 3D modelling, ultra depth of field image synthesis is suitable for depth measurement of products with stepped surfaces, blind holes, grooves and irregular shapes |
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4. Image Capture FunctionReal-time high quality imagespositioning, focusing, magnification conversion and other functions can be performed all through the user friendly software by simply placing a sample on the stage. |
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5. 100nm resolution in Z depth / focus
ultra depth of field synthesis, fine full frame. after ultra depth of field (DOF) synthesis function is applied to a high magnification observation, the depth of field of different planes are superimposed to get a stereoscopic 3D observation of image. The z-axis is driven by a high-precise electromotor, which can measure up to 100nm / 0.1um distance between the positions. |
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Mixed of brightfield and darkfield illumination
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Sample images
Below are sample images form semi-condocture industry, copper foil, wafer step, arc height, battery, SMT fields:
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